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    Wear phenomena in chemical mechanical polishing

    New search for: Liang, H.
    New search for: Kaufman, F.
    New search for: Sevilla, R.
    New search for: Anjur, S.

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    Wear phenomena in chemical mechanical polishing

    New search for: Liang, H.
    New search for: Kaufman, F.
    New search for: Sevilla, R.
    New search for: Anjur, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Wear phenomena in chemical mechanical polishing

    New search for: Liang, H.
    New search for: Kaufman, F.
    New search for: Sevilla, R.
    New search for: Anjur, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Wear phenomena in chemical mechanical polishing

    Contributors:

    Liang, H. (author) / Kaufman, F. (author) / Sevilla, R. (author) / Anjur, S. (author)

    Published in:

    WEAR -LAUSANNE- ; 211 ; 271-279

    Publication date:

    1997-01-01

    Size:

    9 pages

    ISSN:

    0043-1648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11292

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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