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Generation Mechanisms of Trapped Charges in Oxide Layers of 6H-SiC MOS Structures Irradiated with Gamma-Rays
Generation Mechanisms of Trapped Charges in Oxide Layers of 6H-SiC MOS Structures Irradiated with Gamma-Rays
Generation Mechanisms of Trapped Charges in Oxide Layers of 6H-SiC MOS Structures Irradiated with Gamma-Rays
Yoshikawa, M. (Autor:in) / Saitoh, K. (Autor:in) / Ohshima, T. (Autor:in) / Itoh, H. (Autor:in) / Nashiyama, I. (Autor:in) / Takahashi, Y. (Autor:in) / Ohnishi, K. (Autor:in) / Okumura, H. (Autor:in) / Yoshida, S. (Autor:in)
MATERIALS SCIENCE FORUM ; 264/268 ; 1017-1020
01.01.1998
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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