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Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects
Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects
Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects
Knowlton, B. D. (Autor:in) / Thompson, C. V. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 13 ; 1164-1170
01.01.1998
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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