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    Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects

    New search for: Knowlton, B. D.
    New search for: Thompson, C. V.

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    Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects

    New search for: Knowlton, B. D.
    New search for: Thompson, C. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects

    New search for: Knowlton, B. D.
    New search for: Thompson, C. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Simulation of the temperature and current density scaling of the electromigration-limited reliability of near-bamboo interconnects

    Contributors:

    Knowlton, B. D. (author) / Thompson, C. V. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 13 ; 1164-1170

    Publication date:

    1998-01-01

    Size:

    7 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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