Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
X-ray photoelectron study in the initial stage of oxynitridation process by excited nitrogen and oxygen
X-ray photoelectron study in the initial stage of oxynitridation process by excited nitrogen and oxygen
X-ray photoelectron study in the initial stage of oxynitridation process by excited nitrogen and oxygen
Saito, Y. (Autor:in) / Iguchi, S. (Autor:in)
APPLIED SURFACE SCIENCE ; 130-132 ; 187-191
01.01.1998
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2003
|Photon- and catalysis-assisted silicon oxynitridation at room temperature: a comparative study
British Library Online Contents | 1993
|Conditions for Gaseous Nitridation and Oxynitridation of Crystalline Silicon Powders
British Library Online Contents | 2010
|Ultrathin oxynitridation process through ion implantation in a poly Si1-xGex gate MOS capacitor
British Library Online Contents | 2003
|British Library Online Contents | 2004
|