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Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
Yokoyama, S. (Autor:in) / Ikeda, N. (Autor:in) / Kajikawa, K. (Autor:in) / Nakashima, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 130-132 ; 352-356
01.01.1998
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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