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Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide
Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide
Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide
Choi, Jong Youn (Autor:in) / Ahles, Christopher F. (Autor:in) / Hung, Raymond (Autor:in) / Kim, Namsung (Autor:in) / Kummel, Andrew C. (Autor:in)
Applied surface science ; 462 ; 1008-1016
01.01.2018
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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