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Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces

Yokoyama, S. / Ikeda, N. / Kajikawa, K. / Nakashima, Y.

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Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces

Yokoyama, S. / Ikeda, N. / Kajikawa, K. / Nakashima, Y.

Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces

Yokoyama, S. / Ikeda, N. / Kajikawa, K. / Nakashima, Y.

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Order at Subito €

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Document information

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Document information

Title:

Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces

Contributors:

Yokoyama, S. (author) / Ikeda, N. (author) / Kajikawa, K. (author) / Nakashima, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 130-132 ; 352-356

Publication date:

1998-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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