Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Adhesion mechanism of copper films deposited by magnetron sputtering on polyamide composites
Adhesion mechanism of copper films deposited by magnetron sputtering on polyamide composites
Adhesion mechanism of copper films deposited by magnetron sputtering on polyamide composites
Legois, V. (Autor:in) / Aucouturier, M. (Autor:in) / Ollivier, E. (Autor:in) / Darque-Ceretti, E. (Autor:in) / Macheto, P. (Autor:in)
SURFACE ENGINEERING -LONDON- ; 14 ; 259-264
01.01.1998
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effect of annealing on adhesion of TiB~2 films deposited by pulsed magnetron sputtering
British Library Online Contents | 2010
|GaN films deposited by middle-frequency magnetron sputtering
British Library Online Contents | 2007
|The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering
British Library Online Contents | 2008
|The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering
British Library Online Contents | 2015
|Preferentially oriented vanadium nitride films deposited by magnetron sputtering
British Library Online Contents | 2011
|