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Effect of annealing on adhesion of TiB~2 films deposited by pulsed magnetron sputtering
Effect of annealing on adhesion of TiB~2 films deposited by pulsed magnetron sputtering
Effect of annealing on adhesion of TiB~2 films deposited by pulsed magnetron sputtering
Arslan, E. (Autor:in) / Totik, Y. (Autor:in) / Celik, A. (Autor:in) / Efeoglu, I. (Autor:in)
SURFACE ENGINEERING -LONDON- ; 26 ; 567-570
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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