Effect of inert gas additive species on Cl"2 high density plasma etching of compound semiconductors - Part I. GaAs and GaSb

Hahn, Y.B. / Hays, D.C. / Cho, H. et al. | British Library Online Contents | 1999

High ion density dry etching of compound semiconductors

Pearton, S. J. | British Library Online Contents | 1996

High selectivity Inductively Coupled Plasma etching of GaAs over InGaP

Hays, D. C. / Cho, H. / Lee, J. W. et al. | British Library Online Contents | 2000

Plasma etching of InGaP, AlInP and AlGaP in BCl~3 environments

Hong, J. / Lee, J. W. / Santana, C. J. et al. | British Library Online Contents | 1996

Selective dry etching using inductively coupled plasmas - Part I. GaAs/AlGaAs and GaAs/InGaP

Hays, D.C. / Cho, H. / Jung, K.B. et al. | British Library Online Contents | 1999