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High quality ELO-GaN layers on GaN/Al"2O"3 patterned substrates by halide vapour phase epitaxy
High quality ELO-GaN layers on GaN/Al"2O"3 patterned substrates by halide vapour phase epitaxy
High quality ELO-GaN layers on GaN/Al"2O"3 patterned substrates by halide vapour phase epitaxy
Nataf, G. (Autor:in) / Beaumont, B. (Autor:in) / Bouille, A. (Autor:in) / Vennegues, P. (Autor:in) / Haffouz, S. (Autor:in) / Vaille, M. (Autor:in) / Gibart, P. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 59 ; 112 - 116
01.01.1999
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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