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Intrinsic microcrystalline silicon (@mc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics
Intrinsic microcrystalline silicon (@mc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics
Intrinsic microcrystalline silicon (@mc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics
Shah, A. (Autor:in) / Vallat-Sauvain, E. (Autor:in) / Torres, P. (Autor:in) / Meier, J. (Autor:in) / Kroll, U. (Autor:in) / Hof, C. (Autor:in) / Droz, C. (Autor:in) / Goerlitzer, M. (Autor:in) / Wyrsch, N. (Autor:in) / Vanecek, M. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 69-70 ; 219 - 226
01.01.2000
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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