Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar: Fid-Bau Portal

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Xiao, X. c. / Li, Y. w. / Song, L. x. / Peng, X. f. / Hu, X. f.

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Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Xiao, X. c. / Li, Y. w. / Song, L. x. / Peng, X. f. / Hu, X. f.

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Xiao, X. c. / Li, Y. w. / Song, L. x. / Peng, X. f. / Hu, X. f.

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Titel:

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Beteiligte:

Xiao, X. c. (Autor:in) / Li, Y. w. (Autor:in) / Song, L. x. (Autor:in) / Peng, X. f. (Autor:in) / Hu, X. f. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 156 ; 155-160

Erscheinungsdatum:

01.01.2000

Format / Umfang:

6 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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