Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar: Fid-Bau Portal

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Xiao, X. c. / Li, Y. w. / Song, L. x. / Peng, X. f. / Hu, X. f.

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Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Xiao, X. c. / Li, Y. w. / Song, L. x. / Peng, X. f. / Hu, X. f.

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Xiao, X. c. / Li, Y. w. / Song, L. x. / Peng, X. f. / Hu, X. f.

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Title:

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Contributors:

Xiao, X. c. (author) / Li, Y. w. (author) / Song, L. x. (author) / Peng, X. f. (author) / Hu, X. f. (author)

Published in:

APPLIED SURFACE SCIENCE ; 156 ; 155-160

Publication date:

2000-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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