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4H-SiC Substrate Orientation Effects on Hydrogen Etching and Epitaxial Growth
4H-SiC Substrate Orientation Effects on Hydrogen Etching and Epitaxial Growth
4H-SiC Substrate Orientation Effects on Hydrogen Etching and Epitaxial Growth
Landini, B. E. (Autor:in) / Brandes, G. R. (Autor:in)
MATERIALS SCIENCE FORUM ; 338/342 ; 185-188
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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