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Improvement of Y2O3/Si interface for FeRAM application
Improvement of Y2O3/Si interface for FeRAM application
Improvement of Y2O3/Si interface for FeRAM application
Ito, D. (Autor:in) / Yoshimura, T. (Autor:in) / Fujimura, N. (Autor:in) / Ito, T. (Autor:in)
APPLIED SURFACE SCIENCE ; 159-160 ; 138-142
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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