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Improvement of Y2O3/Si interface for FeRAM application

Ito, D. / Yoshimura, T. / Fujimura, N. / Ito, T.

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Improvement of Y2O3/Si interface for FeRAM application

Ito, D. / Yoshimura, T. / Fujimura, N. / Ito, T.

Improvement of Y2O3/Si interface for FeRAM application

Ito, D. / Yoshimura, T. / Fujimura, N. / Ito, T.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Improvement of Y2O3/Si interface for FeRAM application

Contributors:

Ito, D. (author) / Yoshimura, T. (author) / Fujimura, N. (author) / Ito, T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 159-160 ; 138-142

Publication date:

2000-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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