Buried-oxide layer formation by high-dose oxygen-ion implantation into Si wafers: SIMOX (separation by implanted oxygen)

Kajiyama, K. | British Library Online Contents | 1995

FTIR reflectance characterization of SIMOX buried oxide layers [3425-01]

Yakovlev, V. A. / Charpenay, S. / Rosenthal, P. A. et al. | British Library Conference Proceedings | 1998

Formation of Si islands in the buried oxide layers of ultra-thin SIMOX structures implanted at 65 keV

Jiao, J. / Johnson, B. / Seraphin, S. et al. | British Library Online Contents | 2000

Photoluminescence Study on Point Defects in SIMOX Buried SiO~2 Film

Seol, K. S. / Ieki, A. / Ohki, Y. et al. | British Library Online Contents | 1995

Ellipsometric analysis of ultrathin oxide layers on SIMOX wafers

Motooka, T. / Kusano, Y. / Nisihira, K. et al. | British Library Online Contents | 2000