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Towards sub-10nm carrier profiling with spreading resistance techniques
Towards sub-10nm carrier profiling with spreading resistance techniques
Towards sub-10nm carrier profiling with spreading resistance techniques
Clarysse, T. (Autor:in) / Eyben, P. (Autor:in) / Hantschel, T. (Autor:in) / Vandervorst, W. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 61-66
01.01.2001
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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