Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS): Fid-Bau Portal

Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS)

Zhang, J. / Tan, K. L. / Gong, H. Q.

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Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS)

Zhang, J. / Tan, K. L. / Gong, H. Q.

Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS)

Zhang, J. / Tan, K. L. / Gong, H. Q.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

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Titel:

Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS)

Beteiligte:

Zhang, J. (Autor:in) / Tan, K. L. (Autor:in) / Gong, H. Q. (Autor:in)

Erschienen in:

POLYMER TESTING -LONDON- ; 20 ; 693-701

Erscheinungsdatum:

01.01.2001

Format / Umfang:

9 pages

ISSN:

0142-9418

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.192

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