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In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy
In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy
In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy
Hecht, J. D. (Autor:in) / Frost, F. (Autor:in) / Chasse, T. (Autor:in) / Hirsch, D. (Autor:in) / Neumann, H. (Autor:in) / Schindler, A. (Autor:in) / Bigl, F. (Autor:in)
APPLIED SURFACE SCIENCE ; 179 ; 197-203
01.01.2001
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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