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    In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy

    New search for: Hecht, J. D.
    New search for: Frost, F.
    New search for: Chasse, T.
    New search for: Hirsch, D.
    New search for: Neumann, H.
    New search for: Schindler, A.
    New search for: Bigl, F.

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    In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy

    New search for: Hecht, J. D.
    New search for: Frost, F.
    New search for: Chasse, T.
    New search for: Hirsch, D.
    New search for: Neumann, H.
    New search for: Schindler, A.
    New search for: Bigl, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy

    New search for: Hecht, J. D.
    New search for: Frost, F.
    New search for: Chasse, T.
    New search for: Hirsch, D.
    New search for: Neumann, H.
    New search for: Schindler, A.
    New search for: Bigl, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
    Order at Subito €

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    Document information
    Title:

    In situ characterization of the nitridation of AIII-BV semiconductor surfaces by means of X-ray photoelectron spectroscopy

    Contributors:

    Hecht, J. D. (author) / Frost, F. (author) / Chasse, T. (author) / Hirsch, D. (author) / Neumann, H. (author) / Schindler, A. (author) / Bigl, F. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 179 ; 197-203

    Publication date:

    2001-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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