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Rapid photo-oxidation of silicon at room temperature using 126 nm vacuum ultraviolet radiation
Rapid photo-oxidation of silicon at room temperature using 126 nm vacuum ultraviolet radiation
Rapid photo-oxidation of silicon at room temperature using 126 nm vacuum ultraviolet radiation
Zhang, J. Y. (Autor:in) / Boyd, I. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 186 ; 64-68
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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