Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum

Majamaa, T. / Kilpela, O. / Novikov, S. et al. | British Library Online Contents | 1999

Fabrication of ultrathin silicon dioxide layers in ultra high vacuum

Majamaa, T. / Airaksinen, V.-M. / Sinkkonen, J. | British Library Online Contents | 1996

Room-temperature oxidation of ultrathin TiB~2 films

Huang, F. / Liu, W. J. / Sullivan, J. F. et al. | British Library Online Contents | 2002

Ultrathin Au layers on Si(100): surface silicide formation at room temperature

Ceelen, W. C. A. N. / Moest, B. / De Ridder, M. et al. | British Library Online Contents | 1998

Room temperature plasma oxidation in DCSBD: A new method for preparation of silicon dioxide films at atmospheric pressure

Skacelova, D. / Danilov, V. / Schafer, J. et al. | British Library Online Contents | 2013