Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD
Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD
Deposition of hydrogenated amorphous silicon-carbon films by vacuum ultraviolet photo-CVD
Fujii, T. (Autor:in) / Yoshimoto, M. (Autor:in) / Fuyuki, T. (Autor:in) / Matsunami, H. (Autor:in)
APPLIED SURFACE SCIENCE ; 79/80 ; 316
01.01.1994
316 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Plasmochemical deposition of amorphous hydrogenated silicon films
British Library Online Contents | 1999
|British Library Online Contents | 1993
|British Library Online Contents | 1995
|Some peculiarities in ultraviolet absorption spectra for hydrogenated amorphous carbon thin films
British Library Online Contents | 2002
|Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
British Library Online Contents | 2010
|