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Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Pauleau, Y. / Thiery, F.

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Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Pauleau, Y. / Thiery, F.

Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Pauleau, Y. / Thiery, F.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Dokumentinformationen

Titel:

Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Beteiligte:

Pauleau, Y. (Autor:in) / Thiery, F. (Autor:in)

Erschienen in:

MATERIALS LETTERS ; 56 ; 1053-1058

Erscheinungsdatum:

01.01.2002

Format / Umfang:

6 pages

ISSN:

0167-577X

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.1105 / 530

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