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Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Pauleau, Y. / Thiery, F.

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Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Pauleau, Y. / Thiery, F.

Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Pauleau, Y. / Thiery, F.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nanostructured copper-carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process

Contributors:

Pauleau, Y. (author) / Thiery, F. (author)

Published in:

MATERIALS LETTERS ; 56 ; 1053-1058

Publication date:

2002-01-01

Size:

6 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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