Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Plasma cleaning of carbon species for silicon homoepitaxial growth
Plasma cleaning of carbon species for silicon homoepitaxial growth
Plasma cleaning of carbon species for silicon homoepitaxial growth
Kim, H. W. (Autor:in) / Hwang, W. S. (Autor:in) / Lee, C. (Autor:in) / Reif, R. (Autor:in)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 1067-1068
01.01.2003
2 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2005
|Low-temperature silicon homoepitaxial growth by pulsed magnetron sputtering
British Library Online Contents | 2004
|Homoepitaxial Growth of Cubic Silicon Carbide by Sublimation Epitaxy
British Library Online Contents | 2002
|Homoepitaxial Growth of 4H-SiC Using a Chlorosilane Silicon Precursor
British Library Online Contents | 2006
|Homoepitaxial Growth of 4H-SiC Using CH~3Cl Carbon Precursor
British Library Online Contents | 2005
|