Defect annealing in ion implanted silicon carbide

Calcagno, L. / Grimaldi, M. G. / Musumeci, P. | British Library Online Contents | 1997

Diffusion modelling of low-energy ion-implanted BF2 in crystalline silicon: Study of fluorine vacancy effect on boron diffusion

Marcon, J. / Merabet, A. | British Library Online Contents | 2008

Characterization of vacancy-like defects in boron-implanted silicon with slow positrons

Gebauer, J. / Eichler, S. / Krause-Rehberg, R. et al. | British Library Online Contents | 1997

Defect production and annealing in ion implanted silicon carbide

Heft, A. / Wendler, E. / Bachmann, T. et al. | British Library Online Contents | 1995

Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Sakaguchi, I. / Adachi, Y. / Ogaki, T. et al. | British Library Online Contents | 2009