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Microstructural evolution of low-dose separation by implanted oxygen materials implanted at 65 and 100 keV
Microstructural evolution of low-dose separation by implanted oxygen materials implanted at 65 and 100 keV
Microstructural evolution of low-dose separation by implanted oxygen materials implanted at 65 and 100 keV
Jeoung, J. S. (Autor:in) / Anderson, P. (Autor:in) / Seraphin, S. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 18 ; 2177-2187
01.01.2003
11 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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