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BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor
BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor
BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor
Lim, W. T. (Autor:in) / Baek, I. K. (Autor:in) / Lee, J. W. (Autor:in) / Lee, E. S. (Autor:in) / Jeon, M. H. (Autor:in) / Cho, G. S. (Autor:in) / Pearton, S. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 222 ; 74-81
01.01.2004
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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