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BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor
BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor
BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor
Lim, W. T. (author) / Baek, I. K. (author) / Lee, J. W. (author) / Lee, E. S. (author) / Jeon, M. H. (author) / Cho, G. S. (author) / Pearton, S. J. (author)
APPLIED SURFACE SCIENCE ; 222 ; 74-81
2004-01-01
8 pages
Article (Journal)
English
DDC:
621.35
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