Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering
Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering
Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering
Shen, Y. G. (Autor:in) / Liu, Z.-J. (Autor:in) / Jiang, N. (Autor:in) / Zhang, H. S. (Autor:in) / Chan, K. H. (Autor:in) / Xu, Z. K. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 523-534
01.01.2004
12 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Properties of titanium nitride films prepared by direct current magnetron sputtering
British Library Online Contents | 2007
|British Library Online Contents | 2004
|Titanium Nitride - Silicon Nitride Composite Coatings Deposited by Reactive Magnetron Sputtering
British Library Online Contents | 1998
|Deposition of Titanium Nitride Thin Films onto Silicon by RF Reactive Magnetron Sputtering
British Library Online Contents | 2009
|Tantalum oxide films prepared by unbalanced reactive magnetron sputtering
British Library Online Contents | 1999
|