Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering: Fid-Bau Portal

Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

Shen, Y. G. / Liu, Z.-J. / Jiang, N. / Zhang, H. S. / Chan, K. H. / Xu, Z. K.

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Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

Shen, Y. G. / Liu, Z.-J. / Jiang, N. / Zhang, H. S. / Chan, K. H. / Xu, Z. K.

Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

Shen, Y. G. / Liu, Z.-J. / Jiang, N. / Zhang, H. S. / Chan, K. H. / Xu, Z. K.

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Check availability in my library

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Document information

Title:

Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

Contributors:

Shen, Y. G. (author) / Liu, Z.-J. (author) / Jiang, N. (author) / Zhang, H. S. (author) / Chan, K. H. (author) / Xu, Z. K. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 523-534

Publication date:

2004-01-01

Size:

12 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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