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Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS
Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS
Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS
Takagi, S. i. (Autor:in) / Mizuno, T. (Autor:in) / Tezuka, T. (Autor:in) / Sugiyama, N. (Autor:in) / Numata, T. (Autor:in) / Usuda, K. (Autor:in) / Moriyama, Y. (Autor:in) / Nakaharai, S. (Autor:in) / Koga, J. (Autor:in) / Tanabe, A. (Autor:in)
APPLIED SURFACE SCIENCE ; 224 ; 241-247
01.01.2004
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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