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    Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS

    New search for: Takagi, S. i.
    New search for: Mizuno, T.
    New search for: Tezuka, T.
    New search for: Sugiyama, N.
    New search for: Numata, T.
    New search for: Usuda, K.
    New search for: Moriyama, Y.
    New search for: Nakaharai, S.
    New search for: Koga, J.
    New search for: Tanabe, A.

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    Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS

    New search for: Takagi, S. i.
    New search for: Mizuno, T.
    New search for: Tezuka, T.
    New search for: Sugiyama, N.
    New search for: Numata, T.
    New search for: Usuda, K.
    New search for: Moriyama, Y.
    New search for: Nakaharai, S.
    New search for: Koga, J.
    New search for: Tanabe, A.

    Access

    Access via TIB
    Check availability in my library
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    Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS

    New search for: Takagi, S. i.
    New search for: Mizuno, T.
    New search for: Tezuka, T.
    New search for: Sugiyama, N.
    New search for: Numata, T.
    New search for: Usuda, K.
    New search for: Moriyama, Y.
    New search for: Nakaharai, S.
    New search for: Koga, J.
    New search for: Tanabe, A.

    Access

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    Check availability in my library
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    Document information
    Title:

    Fabrication and device characteristics of strained-Si-on-insulator (strained-SOI) CMOS

    Contributors:

    Takagi, S. i. (author) / Mizuno, T. (author) / Tezuka, T. (author) / Sugiyama, N. (author) / Numata, T. (author) / Usuda, K. (author) / Moriyama, Y. (author) / Nakaharai, S. (author) / Koga, J. (author) / Tanabe, A. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 224 ; 241-247

    Publication date:

    2004-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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