Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

PARK, S. G. / KIM, C. W. / SONG, H. Y. et al. | British Library Online Contents | 2005

Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching

Makabe, T. / Petrovic, Z. L. | British Library Online Contents | 2002

Dry etching characteristics of GaN using Cl2/BCl3 inductively coupled plasmas

Zhou, S. / Cao, B. / Liu, S. | British Library Online Contents | 2010

High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas

Sung, Y. J. / Kim, H. S. / Lee, Y. H. et al. | British Library Online Contents | 2001

Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas

Jeong, C. H. / Kim, D. W. / Bae, J. W. et al. | British Library Online Contents | 2002