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Formation of C54 TiSi2 thin films by using high-temperature sputtering and rapid thermal annealing
Formation of C54 TiSi2 thin films by using high-temperature sputtering and rapid thermal annealing
Formation of C54 TiSi2 thin films by using high-temperature sputtering and rapid thermal annealing
Lee, S. J. (Autor:in) / Kim, D. Y. (Autor:in) / Kim, T. W. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 39 ; 3203-3205
01.01.2004
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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