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Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4
Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4
Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4
Arvan, B. (Autor:in) / Khakifirooz, A. (Autor:in) / Tarighat, R. (Autor:in) / Mohajerzadeh, S. (Autor:in) / Goodarzi, A. (Autor:in) / Soleimani, E. A. (Autor:in) / Arzi, E. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 109 ; 17-23
01.01.2004
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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