Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor: Fid-Bau Portal

Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

Dasgupta, A. / Kuppusami, P. / Lawrence, F. / Raghunathan, V. S. / Antony Premkumar, P. / Nagaraja, K. S.

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Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

Dasgupta, A. / Kuppusami, P. / Lawrence, F. / Raghunathan, V. S. / Antony Premkumar, P. / Nagaraja, K. S.

Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

Dasgupta, A. / Kuppusami, P. / Lawrence, F. / Raghunathan, V. S. / Antony Premkumar, P. / Nagaraja, K. S.

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Titel:

Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor

Beteiligte:

Dasgupta, A. (Autor:in) / Kuppusami, P. (Autor:in) / Lawrence, F. (Autor:in) / Raghunathan, V. S. (Autor:in) / Antony Premkumar, P. (Autor:in) / Nagaraja, K. S. (Autor:in)

Erschienen in:

MATERIALS SCIENCE AND ENGINEERING A ; 374 ; 362-368

Erscheinungsdatum:

01.01.2004

Format / Umfang:

7 pages

ISSN:

0921-5093

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

Premkumar, P. A. / Kuppusami, P. / Dasgupta, A. et al. | British Library Online Contents | 2007

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