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Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor
Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor
Plasma assisted metal-organic chemical vapor deposition of hard chromium nitride thin film coatings using chromium(III) acetylacetonate as the precursor
Dasgupta, A. (author) / Kuppusami, P. (author) / Lawrence, F. (author) / Raghunathan, V. S. (author) / Antony Premkumar, P. (author) / Nagaraja, K. S. (author)
MATERIALS SCIENCE AND ENGINEERING A ; 374 ; 362-368
2004-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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