Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne: Fid-Bau Portal

Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

Lee, J. W. / Lim, Y. T. / Baek, I. K. / Yoo, S. Y. / Cho, G. S. / Jeoin, M. H. / Leem, J. Y. / Pearton, S. J.

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Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

Lee, J. W. / Lim, Y. T. / Baek, I. K. / Yoo, S. Y. / Cho, G. S. / Jeoin, M. H. / Leem, J. Y. / Pearton, S. J.

Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

Lee, J. W. / Lim, Y. T. / Baek, I. K. / Yoo, S. Y. / Cho, G. S. / Jeoin, M. H. / Leem, J. Y. / Pearton, S. J.

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Title:

Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

Contributors:

Lee, J. W. (author) / Lim, Y. T. (author) / Baek, I. K. (author) / Yoo, S. Y. (author) / Cho, G. S. (author) / Jeoin, M. H. (author) / Leem, J. Y. (author) / Pearton, S. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 233 ; 402-410

Publication date:

2004-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Lim, W. T. / Baek, I. K. / Lee, J. W. et al. | British Library Online Contents | 2004

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