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Low Temperature (320^oC) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films
Low Temperature (320^oC) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films
Low Temperature (320^oC) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films
Miyajima, S. (Autor:in) / Yamada, A. (Autor:in) / Konagai, M. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 317-320
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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