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Ultra-shallow arsenic implant depth profiling using low-energy nitrogen beams
Ultra-shallow arsenic implant depth profiling using low-energy nitrogen beams
Ultra-shallow arsenic implant depth profiling using low-energy nitrogen beams
Fearn, S. (Autor:in) / Chater, R. (Autor:in) / McPhail, D. (Autor:in)
APPLIED SURFACE SCIENCE ; 231/232 ; 645-648
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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