Chemical Vapor Deposition of Copper for Advanced On-Chip Interconnects

Gelatos, A. V. / Jain, A. / Marsh, R. et al. | British Library Online Contents | 1994

Electron Transport Across Cu/Ta(O)/Ru(O)/Cu Interfaces in Advanced Vertical Interconnects

Lanzillo, Nicholas A. / Briggs, Benjamin D. / Robison, Robert R. et al. | British Library Online Contents | 2019

Electromigration and IC Interconnects

Thompson, C. V. / Lloyd, J. R. | British Library Online Contents | 1993

Electromigration in ULSI interconnects

Tan, C. M. / Roy, A. | British Library Online Contents | 2007

Ultrathin Cr added Ru film as a seedless Cu diffusion barrier for advanced Cu interconnects

Hsu, K. C. / Perng, D. C. / Yeh, J. B. et al. | British Library Online Contents | 2012