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Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers
Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers
Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers
Vomiero, A. (Autor:in) / Boscolo Marchi, E. (Autor:in) / Frabboni, S. (Autor:in) / Quaranta, A. (Autor:in) / Della Mea, G. (Autor:in) / Mariotto, G. (Autor:in) / Felisari, L. (Autor:in) / Butturi, M. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 325-330
01.01.2004
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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