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    Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers

    New search for: Vomiero, A.
    New search for: Boscolo Marchi, E.
    New search for: Frabboni, S.
    New search for: Quaranta, A.
    New search for: Della Mea, G.
    New search for: Mariotto, G.
    New search for: Felisari, L.
    New search for: Butturi, M.

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    Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers

    New search for: Vomiero, A.
    New search for: Boscolo Marchi, E.
    New search for: Frabboni, S.
    New search for: Quaranta, A.
    New search for: Della Mea, G.
    New search for: Mariotto, G.
    New search for: Felisari, L.
    New search for: Butturi, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers

    New search for: Vomiero, A.
    New search for: Boscolo Marchi, E.
    New search for: Frabboni, S.
    New search for: Quaranta, A.
    New search for: Della Mea, G.
    New search for: Mariotto, G.
    New search for: Felisari, L.
    New search for: Butturi, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Title:

    Effects of thermal annealing on the structural properties of sputtered W-Si-N diffusion barriers

    Contributors:

    Vomiero, A. (author) / Boscolo Marchi, E. (author) / Frabboni, S. (author) / Quaranta, A. (author) / Della Mea, G. (author) / Mariotto, G. (author) / Felisari, L. (author) / Butturi, M. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 325-330

    Publication date:

    2004-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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