The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2: Fid-Bau Portal

The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2

Werner, M. / van den Berg, J. A. / Armour, D. G. / Carter, G. / Feudel, T. / Herden, M. / Bersani, M. / Giubertoni, D. / Bailey, P. / Noakes, T. C.

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The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2

Werner, M. / van den Berg, J. A. / Armour, D. G. / Carter, G. / Feudel, T. / Herden, M. / Bersani, M. / Giubertoni, D. / Bailey, P. / Noakes, T. C.

The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2

Werner, M. / van den Berg, J. A. / Armour, D. G. / Carter, G. / Feudel, T. / Herden, M. / Bersani, M. / Giubertoni, D. / Bailey, P. / Noakes, T. C.

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Titel:

The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2

Beteiligte:

Werner, M. (Autor:in) / van den Berg, J. A. (Autor:in) / Armour, D. G. (Autor:in) / Carter, G. (Autor:in) / Feudel, T. (Autor:in) / Herden, M. (Autor:in) / Bersani, M. (Autor:in) / Giubertoni, D. (Autor:in) / Bailey, P. (Autor:in) / Noakes, T. C. (Autor:in)

Erschienen in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 198-202

Erscheinungsdatum:

01.01.2004

Format / Umfang:

5 pages

ISSN:

0921-5107

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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