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Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon
Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon
Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon
Marcon, J. (Autor:in) / Coq, L. I. (Autor:in) / Masmoudi, K. (Autor:in) / Ketata, K. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 339-344
01.01.2004
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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